Ultrafast annealing by flash lamp and laser annealing enables the treatment of near-surface areas of materials with high temperatures in very short times.

At the Helmholtz Innovation Lab "BlitzLab" of the Helmholtz-Zentrum Dresden-Rossendorf (HZDR), ultra-short-time healing processes are developed and optimized for various fields of application in cooperation with industrial partners. The BlitzLab offers its cooperation partners access to an annealing laboratory with several flash lamp and laser facilities and, in collaboration with the HZDR, to many other methods of material treatment and material analysis. Flash lamp annealing has emerged as a method for high-tech materials. In recent years, a wide range of applications and fields have been developed, opening up completely new avenues in industry and science. The BlitzLab focuses on new materials and processes for the following application areas: - Electronics and printed electronics - Sensors and photovoltaics - Energy storage materials and technology

Flash Lamp Annealing (FLA) is a process in which high temperatures are applied for a very short time (nano to milliseconds). During FLA, an energy storage device is discharged via a single flash lamp or an array of flash lamps. The resulting light pulse is absorbed by the substrate or wafer and converted to heat. The flash pulse has a distinct spectral range that extends from the UV to the near IR. Depending on the application, the energy density (intensity), pulse length, repetition rate, temperature atmosphere (air, inert gas, vacuum, etc.), lamp arrangement and handling can be varied enormously.

The BlitzLab offers industry and research partners: - Processing of materials of your interest for industrial or scientific applications. - Research and validation projects on usA - Process development for thermal treatment of materials - Services in the field of usA - Methods of material analysis and ion beam technology in cooperation with the Ion Beam Center (IBC) at HZDR