Precise analysis of the outgassing behavior of your materials under the influence of high vacuum and temperature – for clean processes and reliable components in demanding applications.

The IFW Dresden offers the investigation of the outgassing behavior of materials in a 10-liter UHV chamber with a mass spectrometer connection. Starting at a pressure of 1 × 10⁻⁵ mbar, gas molecules can be detected and clearly assigned to the sample material by comparison with the known basic chamber spectrum. The heatable sample holder allows the outgassing behavior to be analyzed even at defined temperatures up to 450 °C – ideal for material qualification in vacuum technology, semiconductor production, aerospace, and precision manufacturing.



Your benefits



• Detailed residual gas analysis up to mass number 200

• High vacuum conditions up to 8 × 10⁻⁸ mbar

• Temperature-controlled measurements for practical simulation

• Fast sample loading via 100 mm quick-release door

• Reliable difference analysis through known chamber fundamental spectrum



Methods & Equipment



• UHV chamber volume: 10 l

• Final pressure: approx. 8 × 10⁻⁸ mbar (without lock chamber)

• Mass spectrometer: Analysis up to mass number 200

• Heatable sample holder (55 × 55 mm)

• Temperature control: continuously variable up to 450 °C



Fields of application

• Qualification of materials for vacuum and cleanroom applications

• Selection of suitable materials for high vacuum processes

• Analysis of impurities and sources of contamination

• Optimization of components for semiconductor, optics, and aerospace technology